High-performance Full-atomistic Simulation of Optical Thin Films
DOI:
https://doi.org/10.14529/jsfi180325Abstract
The experimental study of the dependence of thin film properties on the deposition conditions may be still a great challenge. Today the progress in high performance computing allows one to perform the investigation of these dependencies on the atomistic level using the classical molecular dynamics (MD) simulation. In the present work the computational cost and efficiency of classical full-atomistic simulation of thin film deposition process using the Lonmonosov-2 supercomputer facilities is discussed. It is demonstrated that using 512 computational cores of the Lomonosov-2 supercomputer ensures the simulation of thin film cluster with technologically meaningful thickness of an optical film. Because of a relatively slow growth of the simulation time with the increase of film thickness we guess that simulations clusters with thicknesses that are several times higher than the currently achieved thicknesses about one hundred nanometers is quite realistic if the number of available computational cores will be increased up to several thousands.
References
Turowski, M., Jup, M., Ehlers, H., Melzig, T., Pflug, A., Ristau, D.: Simulation in Thin Film Technology. In: Lequime, M., Macleod, H.A., Ristau, D. (ed.) SPIE Optical Systems Design 2015, 7-10 September 2015, Jena, Germany. Optical Systems Design 2015: Advances in Optical Thin Films V, vol. 9627, pp. 9627-1–9627-10 (2015), DOI: 10.1117/12.2191693
Grigoriev, F.V., Sulimov, A.V., Kochikov, I.V., Kondakova, O.A., Sulimov, V.B., Tikhonravov, A.V.: High-performance atomistic modeling of optical thin films deposited by energetic processes. Int. J. of High Perform. Comp. Appl. 29, 184–192 (2015), DOI: 10.1177/1094342014560591
Grigoriev, F.V., Sulimov, A.V., Katkova, E.V., Kochikov, I.V., Kondakova, O.A., Sulimov, V.B., Tikhonravov, A.V.: Computational experiments on atomistic modeling of thin film deposition. Applied Optics. 56, C87–C90 (2017), DOI: 10.1364/AO.56.000C87
Grigoriev, F.V., Sulimov, A.V., Katkova, E.V., Kochikov, I.V., Kondakova, O.A., Sulimov, V.B., Tikhonravov, A.V.: Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films. J. of N.-Cryst. Sol. 448, 1–5 (2016), DOI: 10.1016/j.jnoncrysol.2016.06.032
Grigoriev, F.V., Sulimov, A.V., Katkova, E.V., Kochikov, I.V., Kondakova, O.A., Sulimov, V.B., Tikhonravov, A.V.: Annealing of deposited SiO2 thin films: Full-atomistic simulation results. Opt. Mat. Express. 6, 3960–3966 (2016), DOI: 10.1364/OME.6.003960
Abraham, M.J., Murtola, T., Schulz, R., Pll, S., Smith, J.C., Hess, B., Lindahl, E.: GROMACS: High performance molecular simulations through multi-level parallelism from laptops to supercomputers. SoftwareX 12, 19–25 (2015), DOI: 10.1016/j.softx.2015.06.001
Grigoriev, F., Sulimov, V., Tikhonravov, A.: Simulation of the optical coating deposition. Adv. Opt. Techn. 7(12), 13–22 (2018), DOI: 10.1515/aot-2017-0079
Sadovnichy, V., Tikhonravov, A., Voevodin, Vl., Opanasenko, V.: ”Lomonosov”: Supercomputing at Moscow State University. In: Contemporary High Performance Computing: From Petascale toward Exascale. pp. 283–307. Chapman & Hall/CRC Computational Science, CRC Press, Boca Raton, United States (2013)
Downloads
Published
How to Cite
Issue
License
Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution-Non Commercial 3.0 License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.